High flow rate transportable UHP gas supply system

A high flow rate, transportable, ultra high purity gas vaporization and supply system, comprising: (a) a vessel (20; 20') suitable for carrying large quantities of a liquefied gas; (b) a plurality of valves adapted to operate with liquid or gas phases; (c) a loading/unloading unit (30; 30'...

Full description

Saved in:
Bibliographic Details
Main Authors LUSIGNEA, MARK A, GERSHTEIN, VLADIMIR YLIY, MCMAHON, KEVIN J, GREENAWALD, BRUCE HERMAN, DE ALMEIDA BOTELHO, ALEXANDRE, FORD, ROBERT WILLIAM
Format Patent
LanguageEnglish
French
German
Published 30.03.2011
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A high flow rate, transportable, ultra high purity gas vaporization and supply system, comprising: (a) a vessel (20; 20') suitable for carrying large quantities of a liquefied gas; (b) a plurality of valves adapted to operate with liquid or gas phases; (c) a loading/unloading unit (30; 30') disposed on said vessel (20; 20'), preferably at the top of the vessel, for loading and unloading the liquefied gas, the loading/unloading unit preferably including said plurality of valves; (d) at least one heater (50; 50') containing one or more heating elements (54; 54') permanently positioned on the vessel (20; 20') to supply energy into the liquefied gas, said heater (50; 50') adapted to cause said liquefied gas to be supplied through said loading/unloading unit (30; 30') as a gas; and (e) a heater controller (60; 60') adapted to use process variables feedback for regulating said one or more heating elements (54; 54') maintaining and regulating gas output.
Bibliography:Application Number: EP20100186265