High flow rate transportable UHP gas supply system
A high flow rate, transportable, ultra high purity gas vaporization and supply system, comprising: (a) a vessel (20; 20') suitable for carrying large quantities of a liquefied gas; (b) a plurality of valves adapted to operate with liquid or gas phases; (c) a loading/unloading unit (30; 30'...
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Main Authors | , , , , , |
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Format | Patent |
Language | English French German |
Published |
30.03.2011
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Subjects | |
Online Access | Get full text |
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Summary: | A high flow rate, transportable, ultra high purity gas vaporization and supply system, comprising:
(a) a vessel (20; 20') suitable for carrying large quantities of a liquefied gas;
(b) a plurality of valves adapted to operate with liquid or gas phases;
(c) a loading/unloading unit (30; 30') disposed on said vessel (20; 20'), preferably at the top of the vessel, for loading and unloading the liquefied gas, the loading/unloading unit preferably including said plurality of valves;
(d) at least one heater (50; 50') containing one or more heating elements (54; 54') permanently positioned on the vessel (20; 20') to supply energy into the liquefied gas, said heater (50; 50') adapted to cause said liquefied gas to be supplied through said loading/unloading unit (30; 30') as a gas; and
(e) a heater controller (60; 60') adapted to use process variables feedback for regulating said one or more heating elements (54; 54') maintaining and regulating gas output. |
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Bibliography: | Application Number: EP20100186265 |