INTERCONNECT STRUCTURE FOR INTEGRATED CIRCUITS HAVING IMPROVED ELECTROMIGRATION CHARACTERISTICS AND METHOD OF MAKING SUCH STRUCTURE
An interconnect structure for an integrated circuit (IC) device includes an elongated, electrically conductive line comprising one or more segments formed at a first width, w1, and one or more segments formed at one or more additional widths, w2 . . . wN, with the first width being narrower than eac...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English French German |
Published |
16.02.2011
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Subjects | |
Online Access | Get full text |
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Abstract | An interconnect structure for an integrated circuit (IC) device includes an elongated, electrically conductive line comprising one or more segments formed at a first width, w1, and one or more segments formed at one or more additional widths, w2 . . . wN, with the first width being narrower than each of the one or more additional widths; wherein the relationship of the total length, L1, of the one or more conductive segments formed at the first width to the total lengths, L2 . . . LN, of the one or more conductive segments formed at the one or more additional widths is selected such that, for a given magnitude of current carried by the conductive line, a critical length with respect to an electromigration short-length effect benefit is maintained such that a total length of the conductive line, L=L1+L2+ . . . +LN, meets a minimum desired design length regardless of the critical length. |
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AbstractList | An interconnect structure for an integrated circuit (IC) device includes an elongated, electrically conductive line comprising one or more segments formed at a first width, w1, and one or more segments formed at one or more additional widths, w2 . . . wN, with the first width being narrower than each of the one or more additional widths; wherein the relationship of the total length, L1, of the one or more conductive segments formed at the first width to the total lengths, L2 . . . LN, of the one or more conductive segments formed at the one or more additional widths is selected such that, for a given magnitude of current carried by the conductive line, a critical length with respect to an electromigration short-length effect benefit is maintained such that a total length of the conductive line, L=L1+L2+ . . . +LN, meets a minimum desired design length regardless of the critical length. |
Author | CHANDRA, KAUSHIK FILIPPI, RONALD STANDAERT, THEODORUS HU, CHAO-KUN GRUNOW, STEPHAN SANKARAN, SUJATHA SIMON, ANDREW, H |
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DocumentTitleAlternate | VERBINDUNGSSTRUKTUR FÜR INTEGRIERTE SCHALTUNGEN MIT VERBESSERTEN ELEKTROMIGRATIONSEIGENSCHAFTEN UND ZUGEHÖRIGES HERSTELLUNGSVERFAHREN STRUCTURE D'INTERCONNEXION POUR CIRCUITS INTÉGRÉS À CARACTÉRISTIQUES D'ÉLECTROMIGRATION AMÉLIORÉES ET SON PROCÉDÉ DE FABRICATION |
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Snippet | An interconnect structure for an integrated circuit (IC) device includes an elongated, electrically conductive line comprising one or more segments formed at a... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
Title | INTERCONNECT STRUCTURE FOR INTEGRATED CIRCUITS HAVING IMPROVED ELECTROMIGRATION CHARACTERISTICS AND METHOD OF MAKING SUCH STRUCTURE |
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