SYSTEM AND METHODS FOR TARGET MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE

Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of t...

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Bibliographic Details
Main Authors BRANDT, DAVID, C, ERSHOV, ALEXANDER, I, SIMMONS, RODNEY, D, KHODYKIN, OLEH, V, BOWERING, NORBERT, R, BYKANOV, ALEXANDER, N, FOMENKOV, IGOR, V, VASCHENKO, GEORGIY, O
Format Patent
LanguageEnglish
French
German
Published 14.05.2014
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
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Summary:Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
Bibliography:Application Number: EP20090722017