METHOD OF FABRICATING A PROBE DEVICE FOR A METROLOGY INSTRUMENT AND PROBE DEVICE PRODUCED THEREBY

A method of producing a probe device for a metrology instrument such as an AFM includes providing a substrate and forming a tip stock extending upwardly from the substrate. The tip stock is preferably FIB milled to form a tip of the probe device. The tip preferably has a high aspect ratio, with a he...

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Bibliographic Details
Main Authors NAGLE, Steven, WANG, Weijie
Format Patent
LanguageEnglish
French
German
Published 13.10.2021
Subjects
APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM]
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
MEASURING
NANOTECHNOLOGY
PERFORMING OPERATIONS
PHYSICS
SCANNING-PROBE TECHNIQUES OR APPARATUS
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TESTING
TRANSPORTING
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Summary:A method of producing a probe device for a metrology instrument such as an AFM includes providing a substrate and forming a tip stock extending upwardly from the substrate. The tip stock is preferably FIB milled to form a tip of the probe device. The tip preferably has a high aspect ratio, with a height that is at least about 1 micron for performing critical dimension (e.g., deep trench) atomic force microscopy. The stock is preferably pedestal shaped having a distal end that is substantially planar which can be machined into a tip in at least less than about 2 minutes. With the preferred embodiments, the FIB milling step can be completed in substantially fewer and less complicated steps than known techniques to produce a high aspect ratio tip suitable for DT-AFM in less than about one minute.
Bibliography:Application Number: EP20080867154