IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICRO-LITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE

An imaging optical system (7) comprises a plurality of mirrors (M1 to M8), which image an object field (4) in an object plane (5) into an image field (8) in an image plane (9). At least three of the mirrors (M6, M7, M8) are obscured, and thus have a through-opening (21) for imaging light (15) to pas...

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Bibliographic Details
Main Author MANN, HANS-JÜRGEN
Format Patent
LanguageEnglish
French
German
Published 14.05.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An imaging optical system (7) comprises a plurality of mirrors (M1 to M8), which image an object field (4) in an object plane (5) into an image field (8) in an image plane (9). At least three of the mirrors (M6, M7, M8) are obscured, and thus have a through-opening (21) for imaging light (15) to pass through. At least one intermediate image plane (23) is present between the object plane (5) and the image plane (9). The intermediate image plane (23) which is closest to the image plane (9) in the light path between the object field (4) and the image field (8), is spatially arranged between the last mirror (M8) in the light path and the image plane (9). These measures lead to an imaging optical system with improved imaging properties and/or reduced production costs.
Bibliography:Application Number: EP20080802769