Data processing apparatus for generating ink jet printing masks

• Main Author: MARUMOTO, YOSHITOMO
• Format: Patent
• Language: English; French; German
• Published: 10.09.2014
• Subjects: CALCULATING; COMPUTING; COUNTING; HANDLING RECORD CARRIERS; PHYSICS; PRESENTATION OF DATA; RECOGNITION OF DATA; RECORD CARRIERS

A data processing apparatus generates image data to be used for plural scans of first and second nozzle groups for ejecting ink, relative to a predetermined area of a print medium. The apparatus comprises a first means for dividing the image data to be printed on the predetermined area by the first nozzle group, by using a first pattern group having plural mask patterns corresponding to the plural scans, to generate the image data to be printed in each of the plural scans; and a second means for dividing the image data to be printed on the predetermined area by the second nozzle group, by using a second pattern group having plural mask patterns corresponding to the plural scans, to generate the image data to be printed in each of the plural scans. An arrangement of print permitting pixels in one mask pattern included in the first pattern group, which is to be used for generating image data to be printed in a predetermined scan of the plural printing scans, is different from an arrangement of print permitting pixels in one mask pattern included in the second pattern group, which is to be used for generating image data to be printed in the predetermined scan, and low frequency components of an arrangement pattern of print permitting pixels obtained by a logical product of the one mask pattern of the first pattern group and the one mask pattern of the second pattern group based on a correspondence relationship of the two mask patterns when the two mask patterns are used are fewer than that obtained by a logical product of the one mask pattern of the first pattern group and the one mask pattern of the second pattern group based on a correspondence relationship different from the correspondence relationship of the two mask patterns when the two mask patterns are used.