Method of replenishing indium ions in indium electroplating compositions

Methods of replenishing indium ions in indium electroplating compositions are disclosed. Indium ions are replenished during electroplating using indium salts of certain weak acids. The method may be used with soluble and insoluble anodes.

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Bibliographic Details
Main Authors SZOCS, EDIT, GAETHKE, THOMAS, SCHWAGER, FELIX J
Format Patent
LanguageEnglish
French
German
Published 25.11.2009
Subjects
APPARATUS THEREFOR
CHEMISTRY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Summary:Methods of replenishing indium ions in indium electroplating compositions are disclosed. Indium ions are replenished during electroplating using indium salts of certain weak acids. The method may be used with soluble and insoluble anodes.
Bibliography:Application Number: EP20090155152