POROUS LAYER, ITS MANUFACTURING PROCESS AND ITS APPLICATIONS

• Main Authors: HUIGNARD, ARNAUD, BESSON, SOPHIE, ROHAUT, NATHALIE
• Format: Patent
• Language: English; French; German
• Published: 19.08.2009
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GLASS; JOINING GLASS TO GLASS OR OTHER MATERIALS; METALLURGY; MINERAL OR SLAG WOOL; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS

The porous sol-gel silica layer (2) comprises a series of closed pores (10-90%) with smallest characteristic dimension of >= 20 nm. The porous layer is obtained with a solid blowing agent in a particulate form and is coated with a fluorinated organosilane or perfluoroalkylsilane. The pores have spherical or oval shape. The porous layer with pores of different sizes and proportions includes stack of porous layers with increased thickness. The porous layer has a refractive index of = 1.1 at 600 nm. The porous sol-gel silica layer (2) comprises a series of closed pores (10-90%) with smallest characteristic dimension of >= 20 nm. The porous layer is obtained with a solid blowing agent in a particulate form and is coated with a fluorinated organosilane or perfluoroalkylsilane. The pores have spherical or oval shape. The porous layer with pores of different sizes and proportions includes stack of porous layers with increased thickness. The porous layer has a refractive index of = 1.1 at 600 nm and is disposed on a sub-layer to be barrier with alkaline and to be adhesion promoter of silica or silicon oxide derivative such as silicon dioxide, silicon oxide under stoichiometric, oxycarbide, oxynitride or silicon oxycarbonitride. Independent claims are included for: (1) a coated substrate; (2) a solar module; (3) multiple glazing unit; and (4) a method for fabricating the porous sol-gel silica layer on asubstrate.