SEMICONDUCTOR SENSOR DEVICE AND METHOD FOR MANUFACTURING SAME
Provided is a semiconductor sensor device which is manufactured by an MEMS technology wherein machining technology and/or material technology is combined with semiconductor technology for detecting and measuring various physical quantities. In the semiconductor sensor device, cracks which generate i...
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Main Authors | , , , |
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Format | Patent |
Language | English French German |
Published |
03.06.2009
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Subjects | |
Online Access | Get full text |
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Abstract | Provided is a semiconductor sensor device which is manufactured by an MEMS technology wherein machining technology and/or material technology is combined with semiconductor technology for detecting and measuring various physical quantities. In the semiconductor sensor device, cracks which generate in a cap chip and a molding resin are eliminated and air-tightness between a semiconductor sensor chip and the cap chip is ensured. The cracks due to vibration applied when being cut can be eliminated by having the circumference side surface of the cap chip as a wet-etched surface. Furthermore, insulation is ensured by coating the cap chip side surface with an insulating protection film. |
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AbstractList | Provided is a semiconductor sensor device which is manufactured by an MEMS technology wherein machining technology and/or material technology is combined with semiconductor technology for detecting and measuring various physical quantities. In the semiconductor sensor device, cracks which generate in a cap chip and a molding resin are eliminated and air-tightness between a semiconductor sensor chip and the cap chip is ensured. The cracks due to vibration applied when being cut can be eliminated by having the circumference side surface of the cap chip as a wet-etched surface. Furthermore, insulation is ensured by coating the cap chip side surface with an insulating protection film. |
Author | AONO, TAKANORI TAKADA, YOSHIAKI KAZAMA, ATSUSHI OKADA, RYOJI |
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Discipline | Medicine Chemistry Sciences Physics |
DocumentTitleAlternate | DISPOSITIF DETECTEUR SEMI-CONDUCTEUR ET PROCEDE DE FABRICATION ASSOCIE HALBLEITERSENSORVORRICHTUNG UND HERSTELLUNGSVERFAHREN DAFÜR |
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PublicationYear | 2009 |
RelatedCompanies | HITACHI METALS, LTD |
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Snippet | Provided is a semiconductor sensor device which is manufactured by an MEMS technology wherein machining technology and/or material technology is combined with... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT MEASURING MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK PHYSICS SEMICONDUCTOR DEVICES TESTING |
Title | SEMICONDUCTOR SENSOR DEVICE AND METHOD FOR MANUFACTURING SAME |
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