SEMICONDUCTOR SENSOR DEVICE AND METHOD FOR MANUFACTURING SAME

Provided is a semiconductor sensor device which is manufactured by an MEMS technology wherein machining technology and/or material technology is combined with semiconductor technology for detecting and measuring various physical quantities. In the semiconductor sensor device, cracks which generate i...

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Bibliographic Details
Main Authors KAZAMA, ATSUSHI, AONO, TAKANORI, OKADA, RYOJI, TAKADA, YOSHIAKI
Format Patent
LanguageEnglish
French
German
Published 03.06.2009
Subjects
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Summary:Provided is a semiconductor sensor device which is manufactured by an MEMS technology wherein machining technology and/or material technology is combined with semiconductor technology for detecting and measuring various physical quantities. In the semiconductor sensor device, cracks which generate in a cap chip and a molding resin are eliminated and air-tightness between a semiconductor sensor chip and the cap chip is ensured. The cracks due to vibration applied when being cut can be eliminated by having the circumference side surface of the cap chip as a wet-etched surface. Furthermore, insulation is ensured by coating the cap chip side surface with an insulating protection film.
Bibliography:Application Number: EP20070806093