SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES HAVING HIGH-Q WAFER BACK-SIDE CAPACITORS

Methods are provided for fabricating semiconductor IC (integrated circuit) chips having high-Q on-chip capacitors formed on the chip back-side and connected to integrated circuits on the chip front-side using through-wafer interconnects. In one aspect, a semiconductor device includes a semiconductor...

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Main Authors YANG, CHIHAO, RAMACHANDRAN, VIDHYA, DALTON, TIMOTHY, JOSEPH, WONG,KEITH, KWONG HON, HSU, LOUIS, LUN, CLEVENGER, LAWRENCE, RADENS, CARL, JOHN
Format Patent
LanguageEnglish
French
German
Published 21.05.2014
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Abstract Methods are provided for fabricating semiconductor IC (integrated circuit) chips having high-Q on-chip capacitors formed on the chip back-side and connected to integrated circuits on the chip front-side using through-wafer interconnects. In one aspect, a semiconductor device includes a semiconductor substrate having a front side, a back side, and a buried insulating layer interposed between the front and back sides of the substrate. An integrated circuit is formed on the front side of the semiconductor substrate, an integrated capacitor is formed on the back side of the semiconductor substrate, and an interconnection structure is formed through the buried insulating layer to connect the integrated capacitor to the integrated circuit.
AbstractList Methods are provided for fabricating semiconductor IC (integrated circuit) chips having high-Q on-chip capacitors formed on the chip back-side and connected to integrated circuits on the chip front-side using through-wafer interconnects. In one aspect, a semiconductor device includes a semiconductor substrate having a front side, a back side, and a buried insulating layer interposed between the front and back sides of the substrate. An integrated circuit is formed on the front side of the semiconductor substrate, an integrated capacitor is formed on the back side of the semiconductor substrate, and an interconnection structure is formed through the buried insulating layer to connect the integrated capacitor to the integrated circuit.
Author YANG, CHIHAO
HSU, LOUIS, LUN
CLEVENGER, LAWRENCE
WONG,KEITH, KWONG HON
DALTON, TIMOTHY, JOSEPH
RADENS, CARL, JOHN
RAMACHANDRAN, VIDHYA
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– fullname: DALTON, TIMOTHY, JOSEPH
– fullname: WONG,KEITH, KWONG HON
– fullname: HSU, LOUIS, LUN
– fullname: CLEVENGER, LAWRENCE
– fullname: RADENS, CARL, JOHN
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DocumentTitleAlternate INTEGRIERTE HALBLEITERSCHALTUNGSANORDNUNGEN MIT WAFER-RÜCKSEITENKONDENSATOREN HOHER GÜTE
DISPOSITIFS À CIRCUITS INTÉGRÉS SEMI-CONDUCTEURS DOTÉS DE CONDENSATEURS ARRIÈRES À PLAQUETTE À VALEUR Q ÉLEVÉE
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Snippet Methods are provided for fabricating semiconductor IC (integrated circuit) chips having high-Q on-chip capacitors formed on the chip back-side and connected to...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES HAVING HIGH-Q WAFER BACK-SIDE CAPACITORS
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