Photon induced formation of metal comprising elongated nanostructures
The present invention provides a method for forming at least one metal comprising elongated nanostructure (6) on a substrate (1). The method comprises exposing a metal halide compound surface (5) to a photon comprising ambient to initiate formation of the at least one metal comprising elongated nano...
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Main Author | |
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Format | Patent |
Language | English French German |
Published |
07.01.2009
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention provides a method for forming at least one metal comprising elongated nanostructure (6) on a substrate (1). The method comprises exposing a metal halide compound surface (5) to a photon comprising ambient to initiate formation of the at least one metal comprising elongated nanostructure (6). The present invention also provides metal comprising elongated nanostructures (6) obtained by the method according to embodiments of the invention. |
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Bibliography: | Application Number: EP20070075949 |