Photon induced formation of metal comprising elongated nanostructures

The present invention provides a method for forming at least one metal comprising elongated nanostructure (6) on a substrate (1). The method comprises exposing a metal halide compound surface (5) to a photon comprising ambient to initiate formation of the at least one metal comprising elongated nano...

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Main Author DICTUSIES
Format Patent
LanguageEnglish
French
German
Published 07.01.2009
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Summary:The present invention provides a method for forming at least one metal comprising elongated nanostructure (6) on a substrate (1). The method comprises exposing a metal halide compound surface (5) to a photon comprising ambient to initiate formation of the at least one metal comprising elongated nanostructure (6). The present invention also provides metal comprising elongated nanostructures (6) obtained by the method according to embodiments of the invention.
Bibliography:Application Number: EP20070075949