METHOD OF FORMING NANOSCALE FEATURES USING SOFT LITHOGRAPHY

The present invention provides a method of forming a molecular membrane using soft lithography. The method includes forming a pattern having at least one nanoscale feature in a moldable polymer composition and deploying at least a portion of the pattern adjacent a first substrate.

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Bibliographic Details
Main Authors FA, KEQING, HUA, FENG, SHIM, ANNE, BOHN, PAUL, ROGERS, JOHN
Format Patent
LanguageEnglish
French
German
Published 24.12.2008
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MANUFACTURE OR TREATMENT THEREOF
MATERIALS THEREFOR
NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS
NANOTECHNOLOGY
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TRANSPORTING
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Summary:The present invention provides a method of forming a molecular membrane using soft lithography. The method includes forming a pattern having at least one nanoscale feature in a moldable polymer composition and deploying at least a portion of the pattern adjacent a first substrate.
Bibliography:Application Number: EP20070758218