LIQUID APPLICATOR AND METHOD FOR REDUCING THE CONCENTRATION OF BY-PRODUCTS FROM ANTISEPTIC

An applicator for reducing the concentration of unwanted chemicals such as para-chloroaniline (PCA) from an antiseptic solution includes an antiseptic solution in amount sufficient to have an antimicrobial effect on a surface and at least one hydrophobic or hydrophilic material. The hydrophobic or h...

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Bibliographic Details
Main Authors TUFTS, Scott, A, BARDWELL, James, R, FLORES, Jesus, MAGALLON, Angel, G
Format Patent
LanguageEnglish
French
German
Published 19.05.2021
Subjects
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Summary:An applicator for reducing the concentration of unwanted chemicals such as para-chloroaniline (PCA) from an antiseptic solution includes an antiseptic solution in amount sufficient to have an antimicrobial effect on a surface and at least one hydrophobic or hydrophilic material. The hydrophobic or hydrophilic material selectively removes undesired by-products from the antiseptic solution when the antiseptic solution contacts the hydrophobic or hydrophilic material. A method for selectively removing unwanted by-products from an antiseptic solution includes the steps of providing an antiseptic solution in amount sufficient to have an antimicrobial effect on a surface and contacting the antiseptic solution with at least one hydrophobic or hydrophilic material that selectively removes the unwanted by-products from the antiseptic solution.
Bibliography:Application Number: EP20070756989