Illumination system

An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element (4). The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus,...

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Bibliographic Details
Main Authors LUIJKX, CORNELIS PETRUS ANDREAS MARIE, EURLINGS, MARKUS FRANCISCUS ANTONIUS, MULDER, HEINE MELLE, BANINE, VADIM YEVGENYEVICH, VAN DUIJN, CORNELIS JACOBUS, VAN DUIJNHOVEN, MARTINUS, KRIKKE, JAN JAAP, MUIDERMAN, JOHANNES HENDRICK EVERARDUS ALDEGONDA, BOTMA, HAKO
Format Patent
LanguageEnglish
French
German
Published 31.10.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element (4). The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.
Bibliography:Application Number: EP20080075593