MULTILAYER FILMS INCLUDING THERMOPLASTIC SILICONE BLOCK COPOLYMERS

A multilayer film includes a first layer of a first polymeric material and a second layer of a second polymeric material. The first material has a first index of refraction and the second material has a second index of refraction less than the first index of refraction. In one embodiment, the second...

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Main Authors SCHNEIDER, HILDEGARD M, BENSON, KARL E, PURGETT, MARK D, SHERMAN, AUDREY A, LEIR, CHARLES M, LIU, RICHARD Y, JOHNSON, STEPHEN A, HANSEN, RICHARD G
Format Patent
LanguageEnglish
French
German
Published 21.01.2015
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Summary:A multilayer film includes a first layer of a first polymeric material and a second layer of a second polymeric material. The first material has a first index of refraction and the second material has a second index of refraction less than the first index of refraction. In one embodiment, the second material includes a polydiorganosiloxane polyamide block copolymer. In another embodiment, the second material includes a polydiorganosiloxane polyoxamide block copolymer.
Bibliography:Application Number: EP20060847920