Substrate fluorescence mask and creation method
A method is provided for creation of a substrate fluorescence mask having background color(s), UV mark color(s), and distraction color(s), to be printed as an image on a substrate containing optical brightening agents. The method includes selecting (530) one or more UV mark colors for the mask such...
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Main Authors | , |
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Format | Patent |
Language | English French German |
Published |
27.08.2008
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Subjects | |
Online Access | Get full text |
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Summary: | A method is provided for creation of a substrate fluorescence mask having background color(s), UV mark color(s), and distraction color(s), to be printed as an image on a substrate containing optical brightening agents. The method includes selecting (530) one or more UV mark colors for the mask such that the UV mark colors exhibit low contrast against the background color(s) under normal illumination and high contrast against the background color(s) under UV illumination. One or more distraction colors are also selected (540), such that the distraction color(s) exhibit low contrast against the background color(s) under UV illumination and exhibit high contrast against the background color(s) under normal illumination. A distraction pattern, formed from one or more distraction colors, is also selected (560). |
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Bibliography: | Application Number: EP20080101566 |