Plasma processing system

Plasma treatment installation comprises workpiece supports (21), support bases (23) for supporting the workpieces, a hood (25) placed on the workpiece support to surround the supports and form a sealed treatment chamber and a manipulator (13) for automatically charging the support bases with workpie...

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Bibliographic Details
Main Author STRAEMKE, SIEGFRIED
Format Patent
LanguageEnglish
French
German
Published 21.11.2007
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:Plasma treatment installation comprises workpiece supports (21), support bases (23) for supporting the workpieces, a hood (25) placed on the workpiece support to surround the supports and form a sealed treatment chamber and a manipulator (13) for automatically charging the support bases with workpieces. Eine Plasmabehandlungsanlage weist einen Manipulator (13) auf, der mehrere Werkstückträger (21) mit Werkstücken versorgt und diese nach der Behandlung entnimmt. Jeder Werkstückträger (21) bildet zusammen mit einer abnehmbaren Haube (25) einen Behandlungsraum, in dem eine Plasmabehandlung erfolgt. Die Haube (25) wird abdichtend mit einem Sockel (20) verbunden. Während ein Werkstückträger (21) eines Paares bestückt wird, findet an dem anderen Werkstückträger eine Plasmabehandlung statt.
Bibliography:Application Number: EP20070108041