FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER, RESIST COMPOSITION AND RESIST PROTECTIVE FILM COMPOSITION

• Main Authors: TAKEBE, YOKO, SASAKI, TAKASHI, YOKOKOJI, OSAMU, EDA, MASATAKA
• Format: Patent
• Language: English; French; German
• Published: 11.04.2007
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength range, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer. A fluoropolymer having monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1) : €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒCF 2 =CFCF 2 C(CF 3 ) (OR 1 )-(CH 2 ) n CR 2 =CHR 3 €ƒ€ƒ€ƒ€ƒ€ƒ(1) wherein R 1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, or (CH 2 ) a COOR 4 (wherein a is 0 or 1, and R 4 is a hydrogen atom or an alkyl group having at most 20 carbon atoms), each of R 2 and R 3 , which are independent of each other, is a hydrogen atom or an alkyl group having at most 12 carbon atoms, and n is 0 or 2, provided that when n is 0, at least one of R 1 , R 2 and R 3 is other than a hydrogen atom.