Method of producing a nitride semiconductor device and nitride semiconductor device

• Main Authors: UEMATSU, KOJI, NAKAHATA, HIDEAKI, NAKAHATA, SEIJI
• Format: Patent
• Language: English; French; German
• Published: 17.08.2011
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Al x In y Ga 1-x-y N (0‰¦x‰¦1; 0‰¦x‰¦1; 0‰¦x+y‰¦1) layered device chips are produced by the steps of preparing a defect position controlled substrate of Al x In y Ga 1-x-y N (0‰¦x‰¦1; 0‰¦y‰¦1; 0‰¦x+y‰¦ 1) having a closed loop network defect accumulating region H of slow speed growth and low defect density regions ZY of high speed growth enclosed by the closed loop network defect accumulating region H, growing epitaxial upper layers B selectively on the low defect density regions ZY, harmonizing outlines and insides of device chips composed of the upper layers B with the defect accumulating region H and the low defect density regions ZY respectively, forming upper electrodes on the upper layers B or not forming the electrodes, dissolving bottom parts of the upper layers B by laser irradiation or mechanical bombardment, and separating the upper layer parts B as device chips C from each other and from the substrate S. Chip-separation is done instantly by the high power laser irradiation or mechanical shock without cutting the substrate S. The defect position controlled substrate S is repeatedly reused.