METHOD OF FORMING A DEPRESSION IN A SURFACE OF A LAYER OF PHOTORESIST

A method of forming a depression in a surface of a layer of photo-resist comprises exposing a first portion of a layer of photo-resist with a first dose of radiant energy. A second portion of the layer is exposed with a second dose of radiant energy. The second dose is less than the first dose. The...

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Bibliographic Details
Main Authors STRAND, THOMAS R, SHAARAWI, MOHAMMED
Format Patent
LanguageEnglish
French
German
Published 06.01.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
CINEMATOGRAPHY
CORRECTION OF TYPOGRAPHICAL ERRORS
ELECTROGRAPHY
HOLOGRAPHY
i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME
LINING MACHINES
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
PHYSICS
PRINTING
SELECTIVE PRINTING MECHANISMS
STAMPS
THEIR RELEVANT APPARATUS
TRANSPORTING
TYPEWRITERS
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Summary:A method of forming a depression in a surface of a layer of photo-resist comprises exposing a first portion of a layer of photo-resist with a first dose of radiant energy. A second portion of the layer is exposed with a second dose of radiant energy. The second dose is less than the first dose. The layer is baked.
Bibliography:Application Number: EP20040812505