VISION SYSTEM AND METHOD FOR CALIBRATING A WAFER CARRYING ROBOT

A vision system and method for calibrating motion of a robot disposed in a processing system is provided. In one embodiment, a vision system for a processing system includes a camera and a calibration wafer that are positioned in a processing system. The camera is positioned on the robot and is adap...

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Bibliographic Details
Main Authors WYKA, GARY, RICE, MICHAEL, HUDGENS, JEFF, SADIGHI, IRAJ
Format Patent
LanguageEnglish
French
German
Published 21.12.2005
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
CHAMBERS PROVIDED WITH MANIPULATION DEVICES
CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
HAND TOOLS
MANIPULATORS
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
PERFORMING OPERATIONS
PHYSICS
PORTABLE POWER-DRIVEN TOOLS
REGULATING
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:A vision system and method for calibrating motion of a robot disposed in a processing system is provided. In one embodiment, a vision system for a processing system includes a camera and a calibration wafer that are positioned in a processing system. The camera is positioned on the robot and is adapted to obtain image data of the calibration wafer disposed in a predefined location within the processing system. The image data is utilized to calibrate the robots motion.
Bibliography:Application Number: EP20040718852