Method of forming ordered patterns of nanoscale objects

• Main Authors: KORNILOVICH, PAVEL, PETERS, KEVIN FRANCIS, STASIAK, JAMES W
• Format: Patent
• Language: English; French; German
• Published: 04.09.2013
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; BEER; BIOCHEMISTRY; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS OR TEST PAPERS THEREFOR; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL ORENZYMOLOGICAL PROCESSES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; ENZYMOLOGY; HOLOGRAPHY; MANUFACTURE OR TREATMENT THEREOF; MATERIALS THEREFOR; MEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEICACIDS OR MICROORGANISMS; METALLURGY; MICROBIOLOGY; MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES; MICROSTRUCTURAL TECHNOLOGY; MUTATION OR GENETIC ENGINEERING; NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS; NANOTECHNOLOGY; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PROCESSES OF PREPARING SUCH COMPOSITIONS; PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS; SEMICONDUCTOR DEVICES; SPIRITS; TRANSPORTING; VINEGAR; WINE

A structure 100 is provided that is formed with a template 500 defining a pattern having nanoscale features. The template 500 may be positioned on a substrate 420 and include a resist layer 230 having openings formed therein, where the template 500 is configured to accommodate the controlled assembly of nanoscale objects 910.