METHOD FOR OXIDATION OF A LAYER AND CORRESPONDING HOLDER DEVICES FOR A SUBSTRATE

Oxidizing a layer comprises preparing a substrate (114) supporting a layer to be oxidized which is part of a layer stack containing the substrate or base layer and a neighboring layer formed on the surface of the layer to be oxidized facing the base surface, inserting the substrate carrying the laye...

Full description

Saved in:
Bibliographic Details
Main Authors CHUNG, HIN-YIU, GUTT, THOMAS
Format Patent
LanguageEnglish
French
German
Published 25.02.2015
Subjects
BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:Oxidizing a layer comprises preparing a substrate (114) supporting a layer to be oxidized which is part of a layer stack containing the substrate or base layer and a neighboring layer formed on the surface of the layer to be oxidized facing the base surface, inserting the substrate carrying the layer stack into a heating unit (80), feeding an oxidation gas onto the substrate, heating the substrate to a process temperature, acquiring the process temperature during processing via the substrate of a receiving unit (110) for the substrate, and regulating or controlling the substrate temperature at a prescribed theoretical temperature during processing. An Independent claim is also included for a receiving unit having a recess (124) for an exchangeable ring (128) for the substrate.
Bibliography:Application Number: EP20030783922