METHOD FOR PRODUCTION OF A SEMICONDUCTOR STRUCTURE
Production of a semiconductor structure comprises preparing a semiconductor substrate, providing a lower first, a middle second and an upper third mask layer (5,7,9) on a surface of the substrate, forming a first window (11) in the third mask layer, structuring the second mask layer using the window...
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Main Authors | , , , , , , , |
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Format | Patent |
Language | English French German |
Published |
09.12.2009
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Subjects | |
Online Access | Get full text |
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Summary: | Production of a semiconductor structure comprises preparing a semiconductor substrate, providing a lower first, a middle second and an upper third mask layer (5,7,9) on a surface of the substrate, forming a first window (11) in the third mask layer, structuring the second mask layer using the window, structuring the first mask layer using the window, enlarging the window in the third mask layer to form a second window (13), restructuring the second mask layer using the second window, structuring the substrate using the structured third mask layer, restructuring the first mask layer using the second window, and restructuring the substrate using the third mask layer. |
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Bibliography: | Application Number: EP20030794962 |