METHOD FOR PRODUCING A MASK ADAPTED TO A LIGHTING DEVICE

• Main Authors: HASSMANN, JENS, SCHEDEL, THORSTEN, KUNKEL, GERHARD, SCHROEDER, UWE, PAUL, KOWALEWSKI, JOHANNES, VOIGT, INA
• Format: Patent
• Language: English; French; German
• Published: 12.01.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS