SILICON CARBIDE BIPOLAR JUNCTION TRANSISTOR WITH OVERGROWN BASE REGION
Silicon carbide bipolar junction transistors having an overgrown base layer are provided. The bipolar junction transistors can be made with a very thin (e.g., 0.3 mum or less) base layer while still possessing adequate peripheral base resistance values. Self aligning manufacturing techniques for mak...
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Main Authors | , |
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Format | Patent |
Language | English French German |
Published |
12.03.2008
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Subjects | |
Online Access | Get full text |
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Summary: | Silicon carbide bipolar junction transistors having an overgrown base layer are provided. The bipolar junction transistors can be made with a very thin (e.g., 0.3 mum or less) base layer while still possessing adequate peripheral base resistance values. Self aligning manufacturing techniques for making the silicon carbide bipolar junction transistors are also provided. Using these techniques, the spacing between emitter and base contacts on the device can be reduced. The silicon carbide bipolar junction transistors can also be provided with edge termination structures such as guard rings to increase the blocking capabilities of the device. |
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Bibliography: | Application Number: EP20030709157 |