METHOD FOR PHOTOLITHOGRAPHIC STRUCTURING BY MEANS OF A CARBON HARD MASK LAYER WHICH HAS A DIAMOND-LIKE HARDNESS AND IS PRODUCED BY MEANS OF A PLASMA-ENHANCED DEPOSITION METHOD
A carbon hard mask layer is applied to a substrate to be patterned by means of a plasma-enhanced deposition process in such a manner that it has a hardness comparable to that of diamond in at least one layer thickness section. During the production of this diamond-like layer thickness section, the p...
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| Main Authors | , , , , , |
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| Format | Patent |
| Language | English French German |
| Published |
11.08.2004
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| Edition | 7 |
| Subjects | |
| Online Access | Get full text |
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| Abstract | A carbon hard mask layer is applied to a substrate to be patterned by means of a plasma-enhanced deposition process in such a manner that it has a hardness comparable to that of diamond in at least one layer thickness section. During the production of this diamond-like layer thickness section, the parameters used in the deposition are set in such a manner that growth regions which are produced in a form other than diamond-like are removed again in situ by means of subsequent etching processes and that diamond-like regions which are formed are retained. |
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| AbstractList | A carbon hard mask layer is applied to a substrate to be patterned by means of a plasma-enhanced deposition process in such a manner that it has a hardness comparable to that of diamond in at least one layer thickness section. During the production of this diamond-like layer thickness section, the parameters used in the deposition are set in such a manner that growth regions which are produced in a form other than diamond-like are removed again in situ by means of subsequent etching processes and that diamond-like regions which are formed are retained. |
| Author | FUELBER, CARSTEN WEGE, STEPHAN CZECH, GUENTHER KIRCHHOFF, MARKUS STEGEMANN, MAIK VOGT, MIRKO |
| Author_xml | – fullname: STEGEMANN, MAIK – fullname: WEGE, STEPHAN – fullname: VOGT, MIRKO – fullname: FUELBER, CARSTEN – fullname: KIRCHHOFF, MARKUS – fullname: CZECH, GUENTHER |
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| DocumentTitleAlternate | PHOTOLITHOGRAPHISCHES STRUKTURIERUNGSVERFAHREN MIT EINER DURCH EIN PLASMAVERFAHREN ABGESCHIEDENEN KOHLENSTOFF-HARTMASKENSCHICHT MIT DIAMANTARTIGER HÄRTE PROCEDE DE STRUCTURATION PHOTOLITHOGRAPHIQUE AU MOYEN D'UNE COUCHE MASQUE DURE, DE DURETE ANALOGUE AU DIAMANT, OBTENUE PAR DEPOT ASSISTE AU PLASMA |
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| Notes | Application Number: EP20020776865 |
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| RelatedCompanies | INFINEON TECHNOLOGIES AG |
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| Snippet | A carbon hard mask layer is applied to a substrate to be patterned by means of a plasma-enhanced deposition process in such a manner that it has a hardness... |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| Title | METHOD FOR PHOTOLITHOGRAPHIC STRUCTURING BY MEANS OF A CARBON HARD MASK LAYER WHICH HAS A DIAMOND-LIKE HARDNESS AND IS PRODUCED BY MEANS OF A PLASMA-ENHANCED DEPOSITION METHOD |
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