SILICA-BASED LIGHT-WEIGHT EUV LITHOGRAPHY STAGES
A lithographic stage includes a platen having a top face and a bottom face and a holder for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may furth...
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Main Authors | , , , |
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Format | Patent |
Language | English French German |
Published |
09.07.2003
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A lithographic stage includes a platen having a top face and a bottom face and a holder for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system. |
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Bibliography: | Application Number: EP20010973468 |