A METHOD TO AVOID STRIAE IN EUV LITHOGRAPHY MIRRORS

A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding...

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Bibliographic Details
Main Authors HOBBS, THOMAS, W, EDWARDS, MARY, J, MURRAY, GREGORY, L, DAVIS, CLAUDE, L., JR, BEST, MICHAEL, E
Format Patent
LanguageEnglish
French
German
Published 09.07.2003
Edition7
Subjects
CHEMISTRY
DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GLASS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
METALLURGY
MINERAL OR SLAG WOOL
PERFORMING OPERATIONS
POLISHING
TRANSPORTING
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Summary:A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.
Bibliography:Application Number: EP20010979254