Lithographic apparatus and device manufacturing method

A lithographic projection apparatus in which the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1 x 10<-6> K<-1> ther...

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Bibliographic Details
Main Authors MUHLBEYER, MICHAEL, FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS, LOOPSTRA, ERIK ROELOF, MAUL, GUENTER, MEHLKOPP, KLAUS, HOF, ALBRECHT, VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS, SMITS, JOSEPHUS JACOBUS, MOORS, JOHANNES HUBERTUS JOSEPHINA
Format Patent
LanguageEnglish
French
German
Published 21.11.2007
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
GAMMA RAY OR X-RAY MICROSCOPES
HOLOGRAPHY
IRRADIATION DEVICES
MATERIALS THEREFOR
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Summary:A lithographic projection apparatus in which the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1 x 10<-6> K<-1> thereby avoiding the need for expensive cooling systems and/or predictive temperature compensation.
Bibliography:Application Number: EP20020254927