METHOD AND SYSTEM FOR THE EXAMINATION OF SPECIMEN USING A CHARGED PARTICLE BEAM

The present invention provides a method for the examination of specimen with a beam of charged particles. The method provides one or more images of the specimen made with different view angles, so that, compared to a single image of the specimen, a lot of additional information about the specimen ca...

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Bibliographic Details
Main Authors GOLDENSHTEIN, ALEX, ADAMEC, PAVEL, HAAS, NADAV, BEN-AV, RADEL, PEARL, ASHER, PETROV, IGOR
Format Patent
LanguageEnglish
French
German
Published 11.09.2002
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Summary:The present invention provides a method for the examination of specimen with a beam of charged particles. The method provides one or more images of the specimen made with different view angles, so that, compared to a single image of the specimen, a lot of additional information about the specimen can be accessed. The different view angles (angles of incidence) are achieved by tilting the beam between the two images and moving the specimen to a new position so that the displacement of the beam caused by the tilting of the beam is compensated. Accordingly, while displaying/recording the second image the beam scans over the same area as it has scanned while displaying/recording the first image. A deflection and focussing system for the compensation of chromatic aberration and examples of accurate measurements of structures on the surface of a semiconductor are also described.
Bibliography:Application Number: EP19990964573