SINGLE CHAMBER GAS DISCHARGE LASER WITH LINE NARROWED SEED BEAM

A single chamber gas discharge laser system having a pulse power source for producing electrical discharges at the rate of at least 1000 pulses per second. The discharge along with laser optics create two short lived gain media, one for producing a seed beam and the other for amplifying the seed bea...

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Bibliographic Details
Main Authors PAN, XIAOJIANG, PARTLO, WILLIAM, N, ONKELS, ECKEHARD, D
Format Patent
LanguageEnglish
French
German
Published 22.03.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
DEVICES USING STIMULATED EMISSION
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A single chamber gas discharge laser system having a pulse power source for producing electrical discharges at the rate of at least 1000 pulses per second. The discharge along with laser optics create two short lived gain media, one for producing a seed beam and the other for amplifying the seed beam. Laser gas circulation around a chamber circulation path is provided and the electrodes and discharges are arranged so that debris from one of the gain media is not circulated to the other gain media during discharges until the debris has made a loop around at least 90% of the chamber circulation path.
Bibliography:Application Number: EP20000990902