Photoresist composition
Disclosed are photoimageable compositions having improved stripping properties including an organic acid. Also disclosed are methods of enhancing the strippability of photoimageable compositions and methods for manufacturing printed wiring boards using such photoimageable compositions.
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Main Author | |
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Format | Patent |
Language | English French German |
Published |
29.05.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Abstract | Disclosed are photoimageable compositions having improved stripping properties including an organic acid. Also disclosed are methods of enhancing the strippability of photoimageable compositions and methods for manufacturing printed wiring boards using such photoimageable compositions. |
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AbstractList | Disclosed are photoimageable compositions having improved stripping properties including an organic acid. Also disclosed are methods of enhancing the strippability of photoimageable compositions and methods for manufacturing printed wiring boards using such photoimageable compositions. |
Author | KOES, THOMAS A |
Author_xml | – fullname: KOES, THOMAS A |
BookMark | eNrjYmDJy89L5WQQD8jIL8kvSi3OLC5RSM7PLcgvzizJzM_jYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxrgGGRgaWpkbmjobGRCgBAIoAI9A |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
DocumentTitleAlternate | Photoresistzusammensetzung Composition de photoréserve |
Edition | 7 |
ExternalDocumentID | EP1209527A1 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_EP1209527A13 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 15:06:31 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English French German |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_EP1209527A13 |
Notes | Application Number: EP20010309900 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020529&DB=EPODOC&CC=EP&NR=1209527A1 |
ParticipantIDs | epo_espacenet_EP1209527A1 |
PublicationCentury | 2000 |
PublicationDate | 20020529 |
PublicationDateYYYYMMDD | 2002-05-29 |
PublicationDate_xml | – month: 05 year: 2002 text: 20020529 day: 29 |
PublicationDecade | 2000 |
PublicationYear | 2002 |
RelatedCompanies | SHIPLEY COMPANY LLC |
RelatedCompanies_xml | – name: SHIPLEY COMPANY LLC |
Score | 2.557352 |
Snippet | Disclosed are photoimageable compositions having improved stripping properties including an organic acid. Also disclosed are methods of enhancing the... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS |
Title | Photoresist composition |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020529&DB=EPODOC&locale=&CC=EP&NR=1209527A1 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQAbbJzU2Sk0DLKswSdU2SDS11k8xTjXUTDUGni1umJpungFf5-pl5hJp4RZhGMDFkwvbCgM8JLQcfjgjMUcnA_F4CLq8LEINYLuC1lcX6SZlAoXx7txBbFzVY79gINHGl5uJk6xrg7-LvrObsDGSp-QXZgraImhqZOwI7SqzAVrQFaPWfa5gTaFNKAXKN4ibIwBYANCyvRIiBKTVPmIHTGXbxmjADhy90vluYgR28QDO5GCgIzYTFIgziARn5wJ5yajFQvQJoSTh03ZUog4Kba4izhy7Qrni4v-JdA-CuMhZjYAF291MlGBRMTFOBnTJgu8Y8xcIkNcU0McnSHHQZgzHooBzTJGNJBkmcxkjhkZNm4ALfZGJgqmtkKcPAUlJUmioLrFBLkuTAQQEAJLZ4JQ |
link.rule.ids | 230,309,786,891,25585,76894 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3NT4MwFH9Z5se8KeqcnxwMN6IDusqBGFcgqBsjBs1uhEITd9kWwfjv-9rA9KI3Upp-Ja99v_b3fg_gGn1y6hRc0ipGuekUQ9fkVNhmPpTq4q4oaKlYvvEoenWe5mTegUUbC6N0Qr-UOCJaVIH2Xqv9ev1zieUrbmV1wxdYtLoPU883WnRsyYcrwx97QTLzZ8xgDL-M-MWTIaLEog8IlLbQw3alzH7wNpZBKevfJ0q4D9sJNrasD6Ajlhr0WJt4TYPdafPercGOImgWFRY2RlgdQj95XyFSFhXW1yUlvOFdHYEeBimLTOwr28wrC5LNqOxj6CLcFyegO0QgKEO_hpZ3jihJzl0qkzHYUiiHcHsAgz-bOf3n3xX0onQ6ySaP8fMZ7KmsJrfEtNxz6NYfn-ICD9eaX6pl-Qbxf3sY |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Photoresist+composition&rft.inventor=KOES%2C+THOMAS+A&rft.date=2002-05-29&rft.externalDBID=A1&rft.externalDocID=EP1209527A1 |