Continuous vapour deposition
The invention relates to a process for applying a coating to a substrate wherein the coating is formed of at least two components or elements. In a preferred embodiment, the coating is formed of at least two metals. In accordance with the invention, the coating is applied by vapor deposition under c...
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Main Authors | , , |
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Format | Patent |
Language | English French German |
Published |
23.01.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a process for applying a coating to a substrate wherein the coating is formed of at least two components or elements. In a preferred embodiment, the coating is formed of at least two metals. In accordance with the invention, the coating is applied by vapor deposition under choking conditions. |
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Bibliography: | Application Number: EP20000202559 |