Lithographic apparatus with mask clamping apparatus

• Main Authors: DONDERS, SJOERD NICOLAAS LAMBERTUS, VAN EMPEL, TJARKO ADRIAAN RUDOLF
• Format: Patent
• Language: English; French; German
• Published: 13.06.2001
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

An arrangement for supporting a mask 10 comprises a pair of members 14. The mask 10 is held against each member 14 by a vacuum arrangement which prevents relative motion between the mask and members. The members 14 are compliant such that they accommodate flatness variations in the mask 10 but witho...