Lithographic apparatus with mask clamping apparatus

An arrangement for supporting a mask 10 comprises a pair of members 14. The mask 10 is held against each member 14 by a vacuum arrangement which prevents relative motion between the mask and members. The members 14 are compliant such that they accommodate flatness variations in the mask 10 but witho...

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Bibliographic Details
Main Authors DONDERS, SJOERD NICOLAAS LAMBERTUS, VAN EMPEL, TJARKO ADRIAAN RUDOLF
Format Patent
LanguageEnglish
French
German
Published 13.06.2001
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:An arrangement for supporting a mask 10 comprises a pair of members 14. The mask 10 is held against each member 14 by a vacuum arrangement which prevents relative motion between the mask and members. The members 14 are compliant such that they accommodate flatness variations in the mask 10 but without deforming the mask 10.
Bibliography:Application Number: EP20000310188