SYNTHETIC QUARTZ GLASS FOR OPTICAL MEMBER, PROCESS FOR PRODUCING THE SAME, AND METHOD OF USING THE SAME

A process for producing a synthetic quartz glass for an optical member, which comprises a step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet light having a wavelength of 180 nm or shorter to improve the transmittance in a region of wave...

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Bibliographic Details
Main Authors YOSHIZAWA, SHUHEI, KIKUGAWA, SHINYA, MASUI, AKIO, SHIMODAIRA, NORIAKI, IKUTA, YOSHIAKI
Format Patent
LanguageEnglish
French
German
Published 04.04.2001
Edition7
Subjects
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMISTRY
CLEANING
CLEANING IN GENERAL
GLASS
JOINING GLASS TO GLASS OR OTHER MATERIALS
MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
METALLURGY
MINERAL OR SLAG WOOL
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
TRANSPORTING
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Summary:A process for producing a synthetic quartz glass for an optical member, which comprises a step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet light having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths of not longer than 165 nm.
Bibliography:Application Number: EP20000911387