Very stable excimer or molecular fluorine laser

• Main Authors: STAMM, UWE, VOSS, FRANK, BRUNWINKEL, KLAUS, BORNEIS, STEFAN
• Format: Patent
• Language: English; French; German
• Published: 10.11.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; DEVICES USING STIMULATED EMISSION; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS