Novel ester compounds, polymers, resist compositions and patterning process

A novel ester compound having an exo-form 2-alkylbicycloÄ2.2.1Üheptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching...

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Bibliographic Details
Main Authors KINSHO, TAKESHI, HATAKEYAMA, JUN, NISHI, TSUNEHIRO, WATANABE, TAKERU, NAKASHIMA, MUTSUO, WATANABE, OSAMU, KURIHARA, HIDESHI, HASEGAWA, KOJI, TAKEDA, TAKANOBU
Format Patent
LanguageEnglish
French
German
Published 25.01.2006
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:A novel ester compound having an exo-form 2-alkylbicycloÄ2.2.1Üheptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
Bibliography:Application Number: EP19990308687