CHARGED-PARTICLE SOURCE, CONTROL SYSTEM, AND PROCESS

A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam "on" and beam "off" states is presented. The process and control system provide ver...

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Main Authors OSTAN, EDWARD, W, HAYES, ALAN, V, NAVY, ABRAHAM, J, TREYGER, GENRIKH, JACOB, JOHN, LAKIOS, EMMANUEL, N, FREMGEN, ROGER, P., JR, KANAROV, VICTOR
Format Patent
LanguageEnglish
French
German
Published 12.04.2000
Edition7
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Summary:A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam "on" and beam "off" states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction.
Bibliography:Application Number: EP19980930440