METHOD AND DEVICE FOR CLEANING SUBSTRATE SURFACES

The invention relates to a method for cleaning substrate surfaces in which the substrate (11) is brought into contact with ozone in an aqueous solution. In order to guarantee rapid and quantitative cleaning of organic substances sticking to the substrate surface, the invention proposes extensively s...

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Bibliographic Details
Main Authors GENENGER, BERND, MESSMANN, KLAUS
Format Patent
LanguageEnglish
French
German
Published 21.03.2007
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:The invention relates to a method for cleaning substrate surfaces in which the substrate (11) is brought into contact with ozone in an aqueous solution. In order to guarantee rapid and quantitative cleaning of organic substances sticking to the substrate surface, the invention proposes extensively saturating the solution with ozone under overpressure and bringing the solution, which is under overpressure, into contact with the substrate (11).
Bibliography:Application Number: EP19980905311