Lithographic projection apparatus with substrate holder

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Bibliographic Details
Main Author VAN EMPEL, TJARKO ADRIAAN RUDOLF
Format Patent
LanguageEnglish
French
German
Published 18.07.2001
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Bibliography:Application Number: EP19990302392