Polybenzoxazoles and polybenzothiazoles precursors

Polybenzoxazole and polybenzothiazole precursors with good solubility in solvents and metal ion-free aqueous alkaline developers are used in photoresists with diazoketones in an organic solvent. Polybenzoxazole and polybenzothiazole precursors have a partial structure of formula (I). A -A = H, F, CH...

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Bibliographic Details
Main Authors SEZI, RECAI DR, KEITMANN, MICHAEL
Format Patent
LanguageEnglish
French
German
Published 30.10.2013
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:Polybenzoxazole and polybenzothiazole precursors with good solubility in solvents and metal ion-free aqueous alkaline developers are used in photoresists with diazoketones in an organic solvent. Polybenzoxazole and polybenzothiazole precursors have a partial structure of formula (I). A -A = H, F, CH3, CF3, OCH3, OCF3, CH2CH3, CF2CF3, OCH2CH3 or OCF2CF3; T = O or S; m = 0 or 1; Z1 = specified group; provided that when Z1 = phenylene or m = 0, at least one of A -A is not H; An Independent claim is included for a photoresist comprising the above material and a diazoketone in organic solvent.
Bibliography:Application Number: EP19980117334