METHOD OF POST-ETCHING A MECHANICALLY TREATED SUBSTRATE
Method of providing a pattern of apertures and/or cavities in, for example, a glass duct plate of a plasma-addressed liquid crystal display, in which first a mechanical treatment is performed (for example, by means of powder blasting) and then a wet-chemical etching treatment is performed to render...
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Main Authors | , , , , , |
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Format | Patent |
Language | English French German |
Published |
21.05.2003
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | Method of providing a pattern of apertures and/or cavities in, for example, a glass duct plate of a plasma-addressed liquid crystal display, in which first a mechanical treatment is performed (for example, by means of powder blasting) and then a wet-chemical etching treatment is performed to render the walls of the ducts microscopically less rough so that the optical disturbance is reduced and the glass becomes clearer again. |
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Bibliography: | Application Number: EP19970913381 |