METHOD OF POST-ETCHING A MECHANICALLY TREATED SUBSTRATE

Method of providing a pattern of apertures and/or cavities in, for example, a glass duct plate of a plasma-addressed liquid crystal display, in which first a mechanical treatment is performed (for example, by means of powder blasting) and then a wet-chemical etching treatment is performed to render...

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Main Authors BUSIO, JOHANNES, MARIA, MARCUS, IN'T VELD, FREDERIK, HENDRIK, LARSEN, POUL, KJERPY, SPIERINGS, GIJSBERTUS, ADRIANUS, CORNELUS, MARIA, POSTMA, LAMBERTUS, VAN DER PUTTEN, JAN, BAPTIST, PETRUS, HENRIKUS
Format Patent
LanguageEnglish
French
German
Published 21.05.2003
Edition7
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Summary:Method of providing a pattern of apertures and/or cavities in, for example, a glass duct plate of a plasma-addressed liquid crystal display, in which first a mechanical treatment is performed (for example, by means of powder blasting) and then a wet-chemical etching treatment is performed to render the walls of the ducts microscopically less rough so that the optical disturbance is reduced and the glass becomes clearer again.
Bibliography:Application Number: EP19970913381