ANTIFUNGAL SUBSTANCES BE-49385 AND PROCESS FOR PRODUCING THE SAME

The present invention relates to a compound represented by the general formula (I): wherein R1 is a hydrogen atom, or and R2 is a hydrogen atom or a lower alkanoyl group, and an antifungal agent containing it as an active ingredient.

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Bibliographic Details
Main Authors SUDA, HIROYUKI, NAKAJIMA, SHIGERU, KUSHIDA, HIROSHI, KAWAMURA, KENJI, KOJIRI, KATSUHISA, NAGASHIMA, MASAO, UCHIYAMA, SHIGERU
Format Patent
LanguageEnglish
French
German
Published 11.11.1998
Edition6
Subjects
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Summary:The present invention relates to a compound represented by the general formula (I): wherein R1 is a hydrogen atom, or and R2 is a hydrogen atom or a lower alkanoyl group, and an antifungal agent containing it as an active ingredient.
Bibliography:Application Number: EP19960938477