Anti-reflective treatment of reflecting surfaces

• Main Authors: HALIMAOUI, AOMAR, SCHILTZ, ANDRE, FRANCOU, JEAN-MARC
• Format: Patent
• Language: English; French; German
• Published: 01.07.1998
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A process for photolithography of a layer (3) below a photosensitive resin layer (5) in IC manufacture involves forming a porous layer (4) of the same material and of given thickness within and at the surface of the layer (3) to be lithographically structured, prior to deposition of the resin. Prefe...