Anti-reflective treatment of reflecting surfaces
A process for photolithography of a layer (3) below a photosensitive resin layer (5) in IC manufacture involves forming a porous layer (4) of the same material and of given thickness within and at the surface of the layer (3) to be lithographically structured, prior to deposition of the resin. Prefe...
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Main Authors | , , |
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Format | Patent |
Language | English French German |
Published |
01.07.1998
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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