A method for treating gas containing organohalogen compounds, and catalyst for decomposing the organohalogen compounds

A method for treating a gas flow containing organohalogen compounds comprising the steps of contacting the gas flow with catalyst at a temperature below 500 DEG C in the presence of an effective amount of steam, wherein the catalyst contains titania, tungsten oxide, and silica, an atomic ratio of Ti...

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Main Authors YASUDA, TAKESHI, ARATO, TOSHIAKI, TAMATA, SHIN, YAMASHITA, HISAO, KAWAGOSHI, HIROSHI, IKEDA, SHINZO, KANNO, SHUICHI, KATO, AKIRA, AZUHATA, SHIGERU
Format Patent
LanguageEnglish
French
German
Published 10.09.1997
Edition6
Subjects
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
THEIR RELEVANT APPARATUS
TRANSPORTING
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Summary:A method for treating a gas flow containing organohalogen compounds comprising the steps of contacting the gas flow with catalyst at a temperature below 500 DEG C in the presence of an effective amount of steam, wherein the catalyst contains titania, tungsten oxide, and silica, an atomic ratio of Ti and w is in the range of 20 SIMILAR 95 mol % Ti and 80 SIMILAR 5 mol % W, and the amount of silica to titania is in the range of 0.5 SIMILAR 15 wt. %. In accordance with the present invention, the organohalogen compound can be decomposed effectively to carbon monoxide, carbon dioxide, and hydrogen halide. The catalyst of the present invention also has s superior durability.
Bibliography:Application Number: EP19970301219