Resist composition with radiation sensitive acid generator
A radiation sensitive resist compsn. comprises: (a) bis (lower alkyl phenyl) iodonium camphor sulphonate; and (b) a copolymer comprising hydroxystyrene and (meth)acrylate having an acid-clearable substituent.
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Main Authors | , , , |
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Format | Patent |
Language | English French German |
Published |
23.01.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A radiation sensitive resist compsn. comprises: (a) bis (lower alkyl phenyl) iodonium camphor sulphonate; and (b) a copolymer comprising hydroxystyrene and (meth)acrylate having an acid-clearable substituent. |
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Bibliography: | Application Number: EP19960307174 |