Photopolymerizable composition

• Main Authors: KONDO, SYUNICHI, KUNITA, KAZUTO
• Format: Patent
• Language: English; French; German
• Published: 31.07.1996
• Edition: 6
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; THEIR PREPARATION OR CHEMICAL WORKING-UP

A photopolymerizable composition is disclosed, comprising at least (i) a compound having an addition-polymerizable ethylenically unsaturated bond, and (ii) an oxime ether compound. The photopolymerizable composition of the present invention shows high sensitivity to active light rays over a wide range of from ultraviolet ray to visible light and at the same time, the photosensitive material using the photopolymerizable composition of the present invention is improved in the storage stability. Further, the development precipitate generated from the developer waste after development of the photosensitive material is restrained.